Extreme ultraviolet (EUV) lithography employs 13.5 nm photons in a near-vacuum hydrogen background, producing a highly transient, low-density plasma on each exposure pulse. This plasma undergoes rapid ...
Figure 1: Dependence of the ablated depth by GHz burst LIPAA process on the intra-pulse number in GHz burst pulse for the various intra-pulse fluence (0.18, 0.22, 0.27, 0.36, 0.44 and 0.53 J/cm2). GHz ...
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