A new technical paper titled “First Demonstration of High-Performance and Extremely Stable W-Doped In 2 O 3 Gate-All-Around (GAA) Nanosheet FET” was published by researchers at Georgia Institute of ...
A new technical paper titled “Exploring optimal TMDC multi-channel GAA-FET architectures at sub-1nm nodes” was published by researchers at Sungkyunkwan University and Alsemy Inc. “This paper explores ...